Coating apparatus – Gas or vapor deposition – Work support
Patent
1994-03-02
1995-04-04
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Work support
118500, 118729, 118730, 118731, 428408, B32B 900
Patent
active
054034019
ABSTRACT:
A flat substrate carrier comprising a machined main surface for supporting substrates to be treated, a surface opposite to the main surface and coating on all sides. The main surface may have been machined with a view to the removal of the treated substrates from the main surface following treatment. The opposite surface has been subjected to such a machining operation or treatment that the mechanical stresses at both surfaces substantially compensate each other. The opposite surface may be machined over substantially the same area as the main surface, for example by using a material-removing operation or an EDM-operation. Both surfaces may have been subjected to the same operation. In case a treatment is carried out, which treatment may be a physical or a chemical treatment, just like the treatment by which the coating is applied, the thickness of the coating at the opposite surface may be less than the maximum thickness of the coating at the main surface. The substrate carrier itself may comprise graphite, carbon, ceramics, metal or a metal alloy, whilst the coating may comprise silicon carbide, pyrolytic graphite, aluminium nitride, aluminium oxide or silicon nitride. The thickness of the coating may range from 1-1,000 .mu.m. The advantage of the proposed substrate carrier is that it will not warp after the coating has been applied.
REFERENCES:
patent: 4397901 (1983-08-01), Warren
patent: 4424096 (1984-01-01), Kumagai
patent: 4486473 (1984-12-01), Kahe
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patent: 4710428 (1987-12-01), Tamamizu
patent: 4780174 (1988-10-01), Lan
patent: 4907534 (1990-03-01), Huang
patent: 5033538 (1991-07-01), Wagner
Haafkens Maarten H.
Sielcken Marinus O.
Breneman R. Bruce
Lund Jeffrie R.
Xycarb B.V.
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