Cleaning and liquid contact with solids – Processes – Using solid work treating agents
Reexamination Certificate
2006-05-16
2006-05-16
Carrillo, Sharidan (Department: 1746)
Cleaning and liquid contact with solids
Processes
Using solid work treating agents
C134S026000, C134S032000, C134S033000, C134S042000, C134S902000, C015S077000
Reexamination Certificate
active
07045018
ABSTRACT:
A method for cleaning and drying a front and a back surface of a substrate is provided. The method includes brush scrubbing the back surface of the substrate using a brush scrubbing fluid chemistry. The method further includes applying a front meniscus onto the front surface of the substrate upon completing the brush scrubbing of the back surface. The front meniscus includes a front cleaning chemistry that is chemically compatible with the brush scrubbing fluid chemistry.
REFERENCES:
patent: 3953265 (1976-04-01), Hood
patent: 4444492 (1984-04-01), Lee
patent: 4838289 (1989-06-01), Kottman et al.
patent: 5102494 (1992-04-01), Harvey et al.
patent: 5180431 (1993-01-01), Sugimoto et al.
patent: 5271774 (1993-12-01), Leenaars et al.
patent: 5343234 (1994-08-01), Kuehnle
patent: 5361449 (1994-11-01), Akimoto
patent: 5472502 (1995-12-01), Batchelder
patent: 5558111 (1996-09-01), Lofaro
patent: 5601655 (1997-02-01), Bok et al.
patent: 5660642 (1997-08-01), Britten
patent: 5705223 (1998-01-01), Bunkofske
patent: 5709757 (1998-01-01), Hatano et al.
patent: 5807522 (1998-09-01), Brown et al.
patent: 5830334 (1998-11-01), Kobayashi
patent: 5882433 (1999-03-01), Ueno
patent: 5893004 (1999-04-01), Yamamura
patent: 5945351 (1999-08-01), Mathuni
patent: 5975098 (1999-11-01), Yoshitani et al.
patent: 5989478 (1999-11-01), Ouellette et al.
patent: 5997653 (1999-12-01), Yamasaka
patent: 6086454 (2000-07-01), Watanabe et al.
patent: 6092937 (2000-07-01), Snodgrass et al.
patent: 6108932 (2000-08-01), Chai
patent: 6132586 (2000-10-01), Adams et al.
patent: 6214513 (2001-04-01), Cai et al.
patent: 6230722 (2001-05-01), Mitsumori et al.
patent: 6341998 (2002-01-01), Zhang
patent: 6391166 (2002-05-01), Wang
patent: 6398975 (2002-06-01), Mertens et al.
patent: 6417117 (2002-07-01), Davis
patent: 6488040 (2002-12-01), de Larios et al.
patent: 6491764 (2002-12-01), Mertens et al.
patent: 6531206 (2003-03-01), Johnston et al.
patent: 6555017 (2003-04-01), Rushford et al.
patent: 6951042 (2005-10-01), Mikhaylichenko et al.
patent: 2002/0020622 (2002-02-01), Hanson et al.
patent: 2002/0121290 (2002-09-01), Tang et al.
patent: 2002/0125212 (2002-09-01), Mertens et al.
patent: 2004/0060195 (2004-04-01), Garcia et al.
patent: 2004/0060573 (2004-04-01), Woods
patent: 2004/0060581 (2004-04-01), Garcia et al.
patent: 2004/0069319 (2004-04-01), Boyd et al.
patent: 2004/0069329 (2004-04-01), de Larios et al.
patent: 2004/0136494 (2004-07-01), Lof et al.
patent: 2004/0178060 (2004-09-01), Ravkin et al.
patent: 2004/0182422 (2004-09-01), Boyd et al.
patent: 2004/0200409 (2004-10-01), Svirchevski
patent: 2005/0132515 (2005-06-01), Boyd et al.
patent: 0 905 746 (1999-03-01), None
patent: 0 905 747 (1999-03-01), None
patent: 1 489 461 (2004-12-01), None
patent: 1 489 462 (2004-12-01), None
patent: 05837190 (1983-03-01), None
patent: 02280330 (1990-11-01), None
patent: 02309638 (1990-12-01), None
patent: 08277486 (1996-10-01), None
patent: 11-31672 (1999-02-01), None
patent: 11350169 (1999-12-01), None
patent: 2003-151948 (2003-05-01), None
patent: WO 99/16109 (1999-01-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 02/01613 (2002-01-01), None
patent: WO 02/32825 (2002-04-01), None
patent: WO 02/101795 (2002-12-01), None
patent: WO 02/101795 (2002-12-01), None
Britten, “A moving-zone Marangoni drying process for critical cleaning and wet processing”, pp. 143-148, Oct. 1997, Solid State Technology.
Owa et al. “Immersion lithography; its potential performance and issues”, Proceedings of the SPIE, SPIE, Bellingham, VA, US, vol. 5040, No. 1, Feb. 28, 2003, pp. 724-733, XP002294500.
Lim et al., “Atomic Layer deposition of transition metals”, Department of Chemistry and Chemical Biology, Harvard University, Nature Publishing Group, vol. 2, Nov. 2003, pp. 749-754.
ICKnowledge LLC, “Technology Backgrounder: Atmoic Layer Deposition”, ICKnowledge.com, 2004, pp. 1-7.
Machine generated English translation of JP08277486 (Reference K3).
English Summary of JP05837190 (Reference L3).
Machine generated English translation for JP11350169 (Reference L4).
“Chemical vapor deposition”, Wikipedia, the free encyclopedia, http://en.wikipedia.org/wiki/Chemical—vapor—deposition, 2005, p. 1-2.
Sigma-Aldrich, “Atomic Layer Deposition(ALD)”, http://www.sigmaaldrich.com/Area—of—Interest/Chemistry/Materials—Science/Thin—Films, 2005, pp. 1-2.
U.S. Appl. No. 10/742,303, filed Dec. 18, 2003, Boyd et al.
U.S. Appl. No. 10/817,398, filed Apr. 1, 2004, Korolik et al.
U.S. Appl. No. 10/817,355, filed Apr. 1, 2004, Woods.
U.S. Appl. No. 10/817,620, filed Apr. 1, 2004, Woods.
U.S. Appl. No. 10/817,133, filed Apr. 1, 2004, Woods et al.
U.S. Appl. No. 10/834,548, filed Apr. 28, 2004, Hemker et al.
de Larios John M.
Ravkin Michael
Carrillo Sharidan
Lam Research Corporation
Martine & Penilla & Gencarella LLP
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