Substrate-biased I/O and power ESD protection circuits in...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S360000, C257S365000, C257S371000, C257S401000, C257S546000

Reexamination Certificate

active

06979869

ABSTRACT:
A semiconductor device which includes a P-well which is underneath NMOS fingers. The device includes an N-well ring which is configured so that the inner P-well underneath the NMOS fingers is separated from an outer P-well. The inner P-well and outer P-well are connected by a P-substrate resistance which is much higher than the resistance of the P-wells. A P+-diffusion ring surrounding the N-well ring is configured to connect to VSS, i.e., P-taps.

REFERENCES:
patent: 6329694 (2001-12-01), Lee et al.
patent: 6469354 (2002-10-01), Hirata
patent: RE38222 (2003-08-01), Wu
patent: 6750517 (2004-06-01), Ker et al.
patent: 6788507 (2004-09-01), Chen et al.
patent: 6858902 (2005-02-01), Salling et al.
“ESD in Silicon Integrated Circuits”, Design Concepts, Chapter 4, Section 2, p 69-71, pre-2003.
Duvvury, C., “ESD On-Chip Protection in Advanced Technologies”, 1999 ESD tutorial, Orlando, Florida, Sep. 26, 1999.
Duvvury, C et al., “Advanced CMOS Protection Device Trigger Mechanisms During CDM”, EOS/ESD Symposium, 1995.

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