Substrate and method for producing the same, and thin film...

Details Substrate and method for producing the same, and thin film... Substrate and method for producing the same, and thin film...

2005-05-31

2005-05-31

Chaudhari, Chandra (Department: 2813)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Physical stress responsive

C438S762000

Reexamination Certificate

active

06900071

ABSTRACT:
A substrate is provided with a substrate main body made from silicon, and an oxide film for a base formed thereon. The oxide film includes a first oxide film made mainly of a thermal SiO2film formed by thermally oxidizing silicon in the substrate main body, and a second oxide film made of a high-temperature oxide film deposited and formed thereon. Alternatively the second oxide film may be formed by TEOS.

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Wolf, “Silicon Processing for the VLSI Era”, 1986, pp. 182-188, 198-200.

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