Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-05-30
1991-09-03
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430920, 522 63, 522 26, G03F 7031
Patent
active
050454331
ABSTRACT:
A substituted acridine derivative represented by ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are independently hydrogen atoms, alkyl groups, substituted alkyl groups, aryl groups, substituted aryl groups, halogen atoms, or alkoxy groups, and Z.sub.1 is a six-membered heteroaromatic group which has one or two nitrogen atoms in its ring and may have an alkyl substituent having 1 to 8 carbon atoms, or a quinolyl group; and a photopolymerizable composition comprising 0.01 to 10 parts by weight of said derivative, 100 parts by weight of a photopolymerizable compound having a boiling point of 100.degree. C. or higher at atmospheric pressure and at least one kind of ethylenic unsaturated group, and 0 to 400 parts by weight of a thermoplastic organic polymer.
REFERENCES:
patent: 3649632 (1972-03-01), Diebold et al.
patent: 3751259 (1973-08-01), Bauer et al.
patent: 3930865 (1976-01-01), Faust et al.
patent: 4587200 (1986-05-01), Tamoto et al.
patent: 4705740 (1987-11-01), Geissler et al.
Cook et al., Chemical Abstracts, vol. 38:105.sup.6 -105.sup.9 (1944).
Zeng et al., Tetrahedron Letters, vol. 29, No. 40, pp. 5123-5124 (1988).
Chemical Abstracts, Eighth Collective Index, vol. 66-75 formulas C19-C22, 1967-1971, p. 854F, Columbus, Ohio.
Chemical Abstracts, vol. 72, No. 25, 6/22/70, p. 340, Abstract No. 132479j, Columbus, Ohio, U.S. A. K. Sheinkman, et al., "Reactions of cyclammonium cations. VII. Reaction of acridine with activated aromatic compounds in the . . ."
Kakumaru Hajime
Kubota Naohiro
Mashimo Shinya
Minami Yoshitaka
Adeka Argus Chemical Co. Ltd.
Hamilton Cynthia
Hitachi Chemical Co. Ltd.
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