Sub-wavelength structures for reduction of reflective...

Details Sub-wavelength structures for reduction of reflective... Sub-wavelength structures for reduction of reflective...

2005-05-24

2005-05-24

Blum, David S. (Department: 2813)

Active solid-state devices (e.g., transistors, solid-state diode

Thin active physical layer which is

Low workfunction layer for electron emission

C257S680000, C257S704000

Reexamination Certificate

active

06897469

ABSTRACT:
A method for manufacturing optically-transparent lids includes etching sub-wavelength structures on a surface of a lid wafer. The structures may be arrayed in a hexagonally closed-packed pattern.

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patent: WO 0156921 (2001-08-01), None
PCT Notification of Transmittal of the International Search Report and the Written Opinion of the International Searching Authority, or the Declaration mailed Sep. 1, 2004, re PCT/US 2004/012088 filed Apr. 19, 2004 (12 pages).
Nikolajeff, et al.,Fabrication and Simulation of Diffractive Optical Elements with Superimposed Antireflection Subwavelength Gratings, Applied Optics, vol. 39, No. 26, pp. 4842-4846, © 2000Optical Society of America, Sep. 10, 2000.
Deng, et al.,Fabrication and Properties of Visible-Light Subwavelength Amorphous Silicon Transmission Gratings, J. Vac. Sci. Technol. B13(6), pp. 2879-2882, © 1995American Vacuum Society, Nov./Dec. 1995.

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