Sub-resolution assist features

Details Sub-resolution assist features Sub-resolution assist features

2004-09-02

2009-12-15

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C716S030000, C716S030000

Reexamination Certificate

active

07632610

ABSTRACT:
Systems and techniques relating to the layout and use of sub-resolution assist features. In one implementation, a mask includes a first feature and a second feature separated from each other by a gap and a sub-resolution assist feature bridging the gap between the first feature and the second feature.

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Dammel, R., “The Role of Resists in Extending Optical Lithography”,Semiconductor Fabtech—10thEd., pp. 253-264, Feb. 4, 2005.

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