Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1979-02-12
1980-04-08
Newsome, John H.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430942, 430 43, 430314, 430319, 430494, B05D 306
Patent
active
041973321
ABSTRACT:
Sub-100A line width patterns are formed on a member by electron beam conversion and fixing of a resist that arrives at the reaction zone point by surface migration into a resist pattern of a precise thickness and width while the member rests on an electron backscattering control support. The resist is for example a contamination film from a vacuum pump oil used in evacuating the apparatus used to perform the process, e.g. silicone oil.
REFERENCES:
patent: 3056881 (1962-10-01), Schwarz
patent: 3703402 (1972-11-01), Cole
patent: 3961099 (1976-06-01), Gipstein et al.
patent: 3964908 (1976-06-01), Bargon et al.
patent: 3971860 (1976-07-01), Broers et al.
Molzen et al. to be published in "Journ. Amer. Vac. Soc.," 1979.
Broers, "Microelectronics and Reliability," vol. 4 (1965), pp. 103-104.
Broers et al., "Proceedings Ninth International Congress on Electron Microscopy," vol. 3, pp. 343-354 (8-28-78). _
Broers et al., "American Institute of Physics," vol. 44 (1978), pp. 289-297.
Broers et al., "Applied Physics Letters," vol. 33, #5 (Sep. 1978), pp. 392-394.
Broers Alec N.
Cuomo Jerome J.
Laibowitz Robert B.
Molzen, Jr. Walter W.
International Business Machines - Corporation
Newsome John H.
Riddles Alvin J.
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