Stylus system for modifying small structures

Radiant energy – Inspection of solids or liquids by charged particles – Methods

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S306000, C073S105000, C977S856000

Reexamination Certificate

active

11104876

ABSTRACT:
An improved method for rapidly and accurately modifying small structures, including structures on a micron or nanometer scale, suitable for the repair of defects in lithographic photo-masks and semiconductors on a nano-scopic level. Features or samples repaired may be conductive or non-conductive. A single instrument can be employed to both observe the surface of the mask or wafer, and to effectuate the repair of conductive and non-conductive features thereon. Using a Stylus-Nano-Profilometer probe, rapid lateral strokes across the sample surface in a definable pattern at known high applied pressure are used to effectuate defect repair. The tip of the probe can also be dithered rapidly in a pattern or used as to create a jackhammer effect to more effectively remove material from the sample surface.

REFERENCES:
patent: 5307693 (1994-05-01), Griffith et al.
patent: 5756887 (1998-05-01), Bryson, III et al.
patent: 5831181 (1998-11-01), Majumdar et al.
patent: 6006594 (1999-12-01), Karrai et al.
patent: 6178653 (2001-01-01), Griffith
patent: 6197455 (2001-03-01), Yedur et al.
patent: 6250143 (2001-06-01), Bindell et al.
patent: 6353219 (2002-03-01), Kley
patent: 6884999 (2005-04-01), Yedur et al.
patent: 2002/0042081 (2002-04-01), Henderson et al.
patent: 04289861 (1992-10-01), None
patent: 04289861 (1992-10-01), None
patent: WO02/45215 (2002-06-01), None
patent: WO 0245215 (2002-06-01), None
Joseph E. Griffith and David A. Grigg, “Dimensional Metrology with Scanning Probe Microscopes,” J. Appl. Phys. 74 (9) Nov. 1, 1993. R83-R109.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Stylus system for modifying small structures does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stylus system for modifying small structures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stylus system for modifying small structures will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3911779

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.