Computer-aided design and analysis of circuits and semiconductor – Integrated circuit design processing – Optimization
Reexamination Certificate
2011-03-08
2011-03-08
Do, Thuan (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Integrated circuit design processing
Optimization
C716S054000, C716S101000, C716S119000
Reexamination Certificate
active
07904868
ABSTRACT:
A design structure including a semiconductor structure. The semiconductor structure includes (a) a substrate; (b) a first semiconductor device on the substrate; (c) N ILD (Inter-Level Dielectric) layers on the first semiconductor device, wherein N is an integer greater than one; and (d) an electrically conductive line electrically coupled to the first semiconductor device. The electrically conductive line is adapted to carry a lateral electric current in a lateral direction parallel to an interfacing surface between two consecutive ILD layers of the N ILD layers. The electrically conductive line is present in at least two ILD layers of the N ILD layers. The electrically conductive line does not comprise an electrically conductive via that is adapted to carry a vertical electric current in a vertical direction perpendicular to the interfacing surface.
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Feilchenfeld Natalie Barbara
He Zhong-Xiang
Liu Qizhi
Rainey BethAnn
Wang Ping-Chuan
Do Thuan
International Business Machines - Corporation
Kotulak Richard M.
Schmeiser Olsen & Watts
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