Structure to measure both interconnect resistance and...

Details Structure to measure both interconnect resistance and... Structure to measure both interconnect resistance and...

2011-03-01

2011-03-01

Dinh, Paul (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

07900164

ABSTRACT:
A structure for measuring both interconnect resistance and capacitance. The structure comprises a plurality of metallic interconnects, a first circuit for measuring capacitance charging current at a first interconnect and a second circuit for measuring the voltage drop between two positions at a second interconnect. The first circuit includes two electrically connected pseudo-inverters. Two control signals are fed into the two pseudo-inverters such that their associated capacitances are charged and discharged periodically. The first interconnect capacitance is determined by measuring the difference of charging currents between the two pseudo-inverters. A constant current flows through the second circuit and the interconnect resistance is determined by the voltage drop and the constant current.

REFERENCES:
patent: 6499129 (2002-12-01), Srinivasan et al.
patent: 6763504 (2004-07-01), Rao et al.
patent: 2004/0139406 (2004-07-01), Kasapi

Affiliated with

Also associated with

Rating

Structure to measure both interconnect resistance and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Structure to measure both interconnect resistance and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Structure to measure both interconnect resistance and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2649544