Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-08-02
2011-08-02
Smith, Bradley K (Department: 2894)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257SE29262
Reexamination Certificate
active
07989884
ABSTRACT:
A semiconductor structure includes a starting semiconductor substrate having a recessed portion. A semiconductor material is formed in the recessed portion, and has a higher resistivity than the starting semiconductor substrate. A body region extends in the semiconductor material, and has a conductivity type opposite that of the semiconductor material. Source regions extend in the body region, and have a conductivity type opposite that of the body region. A gate electrode extends adjacent to but is insulated from the body region. A first interconnect layer extends over and is in contact with a non-recessed portion of the starting semiconductor substrate. The first interconnect layer and the non-recessed portion provide a top-side electrical contact to portions of the starting semiconductor substrate underlying the semiconductor material.
REFERENCES:
patent: 4487639 (1984-12-01), Lam et al.
patent: 4908328 (1990-03-01), Hu et al.
patent: 5349224 (1994-09-01), Gilbert et al.
patent: 5451538 (1995-09-01), Fitch et al.
patent: 5780343 (1998-07-01), Bashir
patent: 6204098 (2001-03-01), Anceau
patent: 6373100 (2002-04-01), Pages et al.
patent: 6392290 (2002-05-01), Kasem et al.
patent: 6420750 (2002-07-01), Divakaruni et al.
patent: 6653740 (2003-11-01), Kinzer et al.
patent: 7262099 (2007-08-01), Sandhu et al.
patent: 7345342 (2008-03-01), Challa et al.
patent: 7482645 (2009-01-01), Wu et al.
patent: 2006/0148178 (2006-07-01), Bonart et al.
patent: 2006/0157715 (2006-07-01), Lim
patent: 200845156 (2008-11-01), None
patent: 2008/121479 (2008-10-01), None
Notice of Allowance for U.S. Appl. No. 11/694,704, mailed May 23, 2008, 7 pages.
Notice of Allowance for U.S. Appl. No. 11/694,704, mailed Sep. 22, 2008, 8 pages.
International Search Report of the International Searching Authority for PCT Application No. PCT/US2008/055466, mailed Sep. 9, 2008, 3 pages.
Written Opinion of the International Searching Authority for PCT Application No. PCT/US2008/055466, mailed Sep. 9, 2008, 3 pages.
Ho Ihsiu
Wu Chun-Tai
Fairchild Semiconductor Corporation
Karimy Mohammad
Kilpatrick Townsend & Stockton LLP
Smith Bradley K
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