Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-09-06
2010-02-09
Whitmore, Stacy A (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C257S291000
Reexamination Certificate
active
07661077
ABSTRACT:
A design structure embodied in a machine readable medium for use in a design process, the design structure representing a CMOS image sensor device comprising an array of active pixel cells. Each active pixel cell includes a substrate; a photosensing device formed at or below a substrate surface for collecting charge carriers in response to incident light; and, one or more light transmissive conductive wire structures formed above the photosensing device, the one or more conductive wire structures being located in an optical path above the photosensing device. The formed light transmissive conductive wire structures provide both an electrical and optical functions. An optical function is provided by tailoring the thickness of the conductive wire layer to filter light according to a pixel color scheme. Alternately, the light transmissive conductive wire structures may be formed as a microlens structure providing a light focusing function. Electrical functions for the conductive wire layer include use as a capacitor plate, as a resistor or as an interconnect.
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Anderson Brent A.
Ellis-Monaghan John J.
Nowak Edward J.
Canale Anthony J.
Dimyan Magid Y
International Business Machines - Corporation
Scully , Scott, Murphy & Presser, P.C.
Whitmore Stacy A
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