Structure and method of manufacturing the same

Details Structure and method of manufacturing the same Structure and method of manufacturing the same

1991-09-23

1995-02-14

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156662, 1566591, 1566611, 437225, 437228, H01L 2100

Patent

active

053891988

ABSTRACT:
A method of manufacturing structures such as a pressure gauge, an accelerometer and the like with a single crystal material such as silicon uses etching techniques where the shape of a part subjected to stress concentration has a curvature, another part is formed in a plane body and a polyhedron is constituted by combining both.
To attain the above constitution, a wafer of single crystal material is formed with a stepped surface having a value corresponding to at least the depth of the curvature in a first anisotropic etching process using a prescribed etching mask, and in a second anisotropic etching process, an etching mask is used by removing at least a part of the etching mask used in the first anisotropic etching process.

REFERENCES:
patent: 4911783 (1990-03-01), Voboril
patent: 5116457 (1992-05-01), Jerman
patent: 5131978 (1992-07-01), O'Neil

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