Strongly textured atomic ridge nanowindows

Details Strongly textured atomic ridge nanowindows Strongly textured atomic ridge nanowindows

2007-08-21

2007-08-21

Jackson, Jerome (Department: 2815)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C977S882000, C977S888000, C438S690000

Reexamination Certificate

active

11226382

ABSTRACT:
The present invention provides a MOSFET device comprising: a substrate including a plurality of atomic ridges, each of the atomic ridges including a semiconductor layer comprising Si and an dielectric layer comprising a Si compound; a plurality nanogrooves between the atomic ridges; at least one elongated molecule located in at least one of the nanogrooves; a porous gate layer located on top of the plurality of atomic ridges. The present invention also provides a membrane comprising: a substrate; and a plurality of nanowindows in the substrate and a method for forming nanowindows in a substrate.

REFERENCES:
patent: 4983540 (1991-01-01), Yamaguchi et al.
patent: 4987094 (1991-01-01), Colas et al.
patent: 5126574 (1992-06-01), Gallagher
patent: 5258326 (1993-11-01), Morishima et al.
patent: 5296719 (1994-03-01), Hirai et al.
patent: 5300452 (1994-04-01), Chang et al.
patent: 5327675 (1994-07-01), Butler et al.
patent: 5360978 (1994-11-01), Gueret
patent: 5372675 (1994-12-01), Wakabayashi et al.
patent: 5482890 (1996-01-01), Lin et al.
patent: 5567954 (1996-10-01), Dobson et al.
patent: 5607876 (1997-03-01), Biegelsen et al.
patent: 5612255 (1997-03-01), Chapple-Sokol et al.
patent: 5747180 (1998-05-01), Miller et al.
patent: 5858256 (1999-01-01), Minne et al.
patent: 5976444 (1999-11-01), Pearson et al.

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