Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1997-02-24
1998-02-10
Pascal, Robert
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
315205, 315176, H01J 724
Patent
active
057172935
ABSTRACT:
A strike enhancement circuit for a dc power supply, which can be a switched half-bridge supply, creates a high voltage at high impedance to initiate a plasma in a plasma chamber or sputtering chamber. The strike circuit has a plurality of diode bridges that act as full-wave rectifiers or peak detectors. The transformer secondary of the power supply is connected through isolation capacitors to the ac inputs of each of the diode bridges. The dc ports of the diode bridges are stacked in series, and the combined, stacked voltage is applied across the input terminals of the plasma chamber. Each diode bridge also has a storage capacitor connected between the positive and negative dc ports. Positive and negative voltage peaks from the transformer secondary waveform are stored in the storage capacitors. The combined dc outputs applied to the plasma chamber appear as a voltage high enough to initiate a plasma discharge. Once the plasma is present, the impedance of the isolation capacitors prevents the strike circuit from providing the high strike voltage.
REFERENCES:
patent: 3902108 (1975-08-01), Sion
patent: 3909666 (1975-09-01), Tenen
patent: 4812712 (1989-03-01), Ohnishi et al.
patent: 5057988 (1991-10-01), Theroux et al.
patent: 5231564 (1993-07-01), Pellegrino et al.
ENI Technologies Inc.
Pascal Robert
Shingleton Michael
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