Stress-relief layer and stress-compensation collar in...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Assembly of plural semiconductive substrates each possessing...

Reexamination Certificate

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C438S612000, C257SE21514

Reexamination Certificate

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10815968

ABSTRACT:
A stress-relief layer is formed by dispensing a polymer upon a substrate lower surface under conditions to partially embed a solder bump that is disposed upon the lower surface. The stress-relief layer flows against the solder bump. A stress-compensation collar is formed on a board to which the substrate is mated and the SCC partially embeds the solder bump. An article that exhibits a stress-relief layer and a stress-compensation collar is also included. A computing system that includes a stress-relief layer and a stress-compensation collar is also included.

REFERENCES:
patent: 5570506 (1996-11-01), Tawata et al.
patent: 6555414 (2003-04-01), Vanfleteren et al.
patent: 6774497 (2004-08-01), Qi et al.
patent: 6821878 (2004-11-01), Danvir et al.
patent: 2002/0185309 (2002-12-01), Imamura et al.
patent: 2003/0096453 (2003-05-01), Wang et al.
patent: 2003/0218261 (2003-11-01), Capote et al.
patent: 2004/0060963 (2004-04-01), Ludwig et al.
patent: 2004/0118599 (2004-06-01), Chason et al.
patent: 2005/0224951 (2005-10-01), Suh et al.

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