Strained Si/SiGe/SOI islands and processes of making same

Details Strained Si/SiGe/SOI islands and processes of making same Strained Si/SiGe/SOI islands and processes of making same

2007-08-28

2007-08-28

Pert, Evan (Department: 2826)

Active solid-state devices (e.g., transistors, solid-state diode

Thin active physical layer which is

Heterojunction

C257S055000, C257S063000

Reexamination Certificate

active

10979994

ABSTRACT:
A process of making a strained silicon-on-insulator structure is disclosed. A recess is formed in a substrate to laterally isolate an active area. An undercutting etch forms a bubble recess under the active area to partially vertically isolate the active area. A thermal oxidation completes the vertical isolation by use of a minifield oxidation process. The recess is filled to form a shallow trench isolation structure. An active device is also disclosed that is achieved by the process. A system is also disclosed that uses the active device.

REFERENCES:
patent: 3953839 (1976-04-01), Dennison et al.
patent: 4241359 (1980-12-01), Izumi et al.
patent: 4314595 (1982-02-01), Yamamoto et al.
patent: 4589928 (1986-05-01), Dalton
patent: 4631234 (1986-12-01), Larrabee
patent: 4717681 (1988-01-01), Curran
patent: 4962051 (1990-10-01), Liaw
patent: 5234535 (1993-08-01), Beyer et al.
patent: 5343064 (1994-08-01), Spangler et al.
patent: 5426061 (1995-06-01), Sopori
patent: 5441591 (1995-08-01), Imthurn et al.
patent: 5443661 (1995-08-01), Oguro et al.
patent: 5461243 (1995-10-01), Ek et al.
patent: 5482869 (1996-01-01), Kohyama
patent: 5487999 (1996-01-01), Farnworth
patent: 5646053 (1997-07-01), Schepis
patent: 5656886 (1997-08-01), Westphal et al.
patent: 5661044 (1997-08-01), Holland et al.
patent: 5679475 (1997-10-01), Yamagata et al.
patent: 5691230 (1997-11-01), Forbes
patent: 5735949 (1998-04-01), Mantl et al.
patent: 5759898 (1998-06-01), Ek et al.
patent: 5773152 (1998-06-01), Okonogi
patent: 5789859 (1998-08-01), Watkins et al.
patent: 5840590 (1998-11-01), Myers, Jr. et al.
patent: 5854501 (1998-12-01), Kao
patent: 5858819 (1999-01-01), Miyasaka
patent: 5877070 (1999-03-01), Goesele et al.
patent: 5879996 (1999-03-01), Forbes
patent: 5926740 (1999-07-01), Forbes et al.
patent: 5949102 (1999-09-01), Saida et al.
patent: 5963817 (1999-10-01), Chu et al.
patent: 5991225 (1999-11-01), Forbes et al.
patent: 5997378 (1999-12-01), Dynka et al.
patent: 6001711 (1999-12-01), Hashimoto
patent: 6022793 (2000-02-01), Wijaranakula et al.
patent: 6028436 (2000-02-01), Akram et al.
patent: 6049106 (2000-04-01), Forbes
patent: 6054808 (2000-04-01), Watkins et al.
patent: 6077792 (2000-06-01), Farrar
patent: 6083324 (2000-07-01), Henley et al.
patent: 6093623 (2000-07-01), Forbes
patent: 6093624 (2000-07-01), Letavic et al.
patent: 6096433 (2000-08-01), Kikuchi et al.
patent: 6103598 (2000-08-01), Yamagata et al.
patent: 6107661 (2000-08-01), Okabe et al.
patent: 6110793 (2000-08-01), Lee et al.
patent: 6127777 (2000-10-01), Watkins et al.
patent: 6136666 (2000-10-01), So
patent: 6143628 (2000-11-01), Sato et al.
patent: 6172456 (2001-01-01), Cathey et al.
patent: 6174784 (2001-01-01), Forbes
patent: 6175242 (2001-01-01), Akram et al.
patent: 6180487 (2001-01-01), Lin
patent: 6204145 (2001-03-01), Noble
patent: 6228694 (2001-05-01), Doyle et al.
patent: 6251751 (2001-06-01), Chu et al.
patent: 6261876 (2001-07-01), Crowder et al.
patent: 6274457 (2001-08-01), Sakai et al.
patent: 6274460 (2001-08-01), Delgado et al.
patent: 6309907 (2001-10-01), Forbes et al.
patent: 6309950 (2001-10-01), Forbes
patent: 6315826 (2001-11-01), Muramatsu
patent: 6328620 (2001-12-01), Hu
patent: 6338805 (2002-01-01), Anderson
patent: 6339011 (2002-01-01), Gonzalez et al.
patent: 6351028 (2002-02-01), Akram
patent: 6368938 (2002-04-01), Usenko
patent: 6376336 (2002-04-01), Buynoski
patent: 6377070 (2002-04-01), Forbes
patent: 6383924 (2002-05-01), Farrar et al.
patent: 6387732 (2002-05-01), Akram
patent: 6391738 (2002-05-01), Moore
patent: 6392430 (2002-05-01), Akram et al.
patent: 6413827 (2002-07-01), Farrar
patent: 6423613 (2002-07-01), Geusic
patent: 6424001 (2002-07-01), Forbes et al.
patent: 6444534 (2002-09-01), Maszara
patent: 6448601 (2002-09-01), Forbes et al.
patent: 6452713 (2002-09-01), White
patent: 6455397 (2002-09-01), Belford
patent: 6461933 (2002-10-01), Houston
patent: 6469532 (2002-10-01), Akram et al.
patent: 6476434 (2002-11-01), Noble et al.
patent: 6478883 (2002-11-01), Tamatsuka et al.
patent: 6486008 (2002-11-01), Lee
patent: 6489183 (2002-12-01), Farnworth
patent: 6496034 (2002-12-01), Forbes et al.
patent: 6514836 (2003-02-01), Belford
patent: 6515335 (2003-02-01), Christiansen et al.
patent: 6531727 (2003-03-01), Ahn et al.
patent: 6537856 (2003-03-01), Akram
patent: 6538330 (2003-03-01), Forbes
patent: 6541356 (2003-04-01), Fogel et al.
patent: 6542682 (2003-04-01), Cotteverte et al.
patent: 6559491 (2003-05-01), Forbes et al.
patent: 6566682 (2003-05-01), Forbes
patent: 6576993 (2003-06-01), Akram
patent: 6579738 (2003-06-01), Farrar et al.
patent: 6582512 (2003-06-01), Geusic et al.
patent: 6583052 (2003-06-01), Shin
patent: 6583437 (2003-06-01), Mizuno et al.
patent: 6593625 (2003-07-01), Christiansen et al.
patent: 6597203 (2003-07-01), Forbes
patent: 6624006 (2003-09-01), Akram
patent: 6630713 (2003-10-01), Geusic
patent: 6646458 (2003-11-01), Akram et al.
patent: 6649476 (2003-11-01), Forbes
patent: 6649480 (2003-11-01), Fitzgerald et al.
patent: 6649492 (2003-11-01), Chu et al.
patent: 6656782 (2003-12-01), Skotnicki et al.
patent: 6689671 (2004-02-01), Yu et al.
patent: 6703293 (2004-03-01), Tweet et al.
patent: 6703648 (2004-03-01), Xiang et al.
patent: 6717216 (2004-04-01), Doris et al.
patent: 6812508 (2004-11-01), Fukumi
patent: 6825102 (2004-11-01), Bedell et al.
patent: 6855649 (2005-02-01), Christiansen et al.
patent: 6900094 (2005-05-01), Hammond et al.
patent: 6902616 (2005-06-01), Yamazaki et al.
patent: 6929984 (2005-08-01), Forbes et al.
patent: 6963078 (2005-11-01), Chu
patent: 6987037 (2006-01-01), Forbes
patent: 7008854 (2006-03-01), Forbes
patent: 7023051 (2006-04-01), Forbes
patent: 7041575 (2006-05-01), Forbes
patent: 7045874 (2006-05-01), Forbes
patent: 7084429 (2006-08-01), Forbes
patent: 7115480 (2006-10-01), Forbes
patent: 2002/0001965 (2002-01-01), Forbes
patent: 2002/0048968 (2002-04-01), Ahn
patent: 2002/0062782 (2002-05-01), Norris et al.
patent: 2002/0070419 (2002-06-01), Farrar et al.
patent: 2002/0070421 (2002-06-01), Ashburn
patent: 2002/0076896 (2002-06-01), Farrar et al.
patent: 2002/0079557 (2002-06-01), Ahn et al.
patent: 2002/0135020 (2002-09-01), Skotnicki et al.
patent: 2002/0158322 (2002-10-01), Farrar
patent: 2002/0163044 (2002-11-01), Farrar
patent: 2002/0163045 (2002-11-01), Farrar
patent: 2002/0164859 (2002-11-01), Farrar
patent: 2002/0175330 (2002-11-01), Geusic
patent: 2002/0185686 (2002-12-01), Christiansen et al.
patent: 2003/0013323 (2003-01-01), Hammond et al.
patent: 2003/0027406 (2003-02-01), Malone
patent: 2003/0042627 (2003-03-01), Farrar et al.
patent: 2003/0133683 (2003-07-01), Forbes
patent: 2003/0157780 (2003-08-01), Farrar et al.
patent: 2003/0190796 (2003-10-01), Geusic
patent: 2003/0193088 (2003-10-01), Hall
patent: 2003/0197234 (2003-10-01), Farrar
patent: 2003/0201468 (2003-10-01), Christiansen et al.
patent: 2003/0218189 (2003-11-01), Christiansen et al.
patent: 2003/0221189 (2003-11-01), Christiansen et al.
patent: 2003/0227072 (2003-12-01), Forbes
patent: 2004/0171196 (2004-09-01), Walitzki
patent: 2004/0173798 (2004-09-01), Forbes
patent: 2004/0217352 (2004-11-01), Forbes
patent: 2004/0217391 (2004-11-01), Forbes
patent: 2004/0224480 (2004-11-01), Forbes
patent: 2004/0232422 (2004-11-01), Forbes
patent: 2004/0232487 (2004-11-01), Forbes
patent: 2004/0232488 (2004-11-01), Forbes
patent: 2004/0235264 (2004-11-01), Forbes
patent: 2005/0017273 (2005-01-01), Forbes et al.
patent: 2005/0020094 (2005-01-01), Forbes et al.
patent: 2005/0023529 (2005-02-01), Forbes
patent: 2005/0023612 (2005-02-01), Forbes
patent: 2005/0023616 (2005-02-01), Forbes
patent: 2005/0029619 (2005-02-01), Forbes
patent: 2005/0029683 (2005-02-01), Forbes et al.
patent: 2005/0032296 (2005-02-01), Forbes
patent: 2005/0250274 (2005-11-01), Forbes et al.
patent: 2005/0285139 (2005-12-01), Forbes
patent: 2006/0001094 (2006-01-01), Forbes
patent: 2006/0011982 (2006-01-01), Forbes
patent: 2006/0097281 (2006-05-01), Forbes
patent: 2006/0208343 (2006-09-01), Forbes
patent: 2006/0244105 (2006-11-01), Forbes et al.
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