Strained-channel fin field effect transistor (FET) with a...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S368000, C257SE29040

Reexamination Certificate

active

07915685

ABSTRACT:
A semiconductor device (and method for making the same) includes a strained-silicon channel formed adjacent a source and a drain, a first gate formed over a first side of the channel, a second gate formed over a second side of the channel, a first gate dielectric formed between the first gate and the strained-silicon channel, and a second gate dielectric formed between the second gate and the strained-silicon channel. The strained-silicon channel is non-planar.

REFERENCES:
patent: 6413802 (2002-07-01), Hu et al.
patent: 6583496 (2003-06-01), Galtie et al.
patent: 6593625 (2003-07-01), Christiansen et al.
patent: 6611029 (2003-08-01), Ahmed et al.
patent: 6794718 (2004-09-01), Nowak et al.
patent: 6800910 (2004-10-01), Lin et al.
patent: 6909186 (2005-06-01), Chu
patent: 6911383 (2005-06-01), Doris et al.
patent: 6921982 (2005-07-01), Joshi et al.
patent: 7355253 (2008-04-01), Cohen
patent: 2002/0011628 (2002-01-01), Takagai
patent: 2003/0127646 (2003-07-01), Christiansen et al.
patent: 2003/0178677 (2003-09-01), Clark et al.
patent: 001519420 (2005-03-01), None
patent: 2001-217430 (2001-08-01), None
patent: 2002-057329 (2002-02-01), None
patent: 2002-198538 (2002-07-01), None
patent: 2004-128185 (2004-04-01), None
patent: 2006505950 (2006-02-01), None
Yang-Kyu Choi, Tsu-Jae King, Chenming Hu, “Spacer FinFET: nanoscale double-gate CMOS technology for the terabit era”, Solid-State Electronics, 46, pp. 1595-1601, 2002.
K. Rim, J.L. Hoyt, J.F. Gibbons, “Fabrication and Analysis of Deep Submicron Strained-Si N-MOSFET's”, IEEE Trans. Electron Devices, 47(7), p. 1406-1415.
P.M. Mooney, “Stain Relaxation and Dislocations in SiGe/Si Structures”, Materials Science & Engineering, R Reports: A Review Journal, Continuation of Materials Science Reports, vol. R17, No. 3, pp. 105-146, (1996).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Strained-channel fin field effect transistor (FET) with a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Strained-channel fin field effect transistor (FET) with a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Strained-channel fin field effect transistor (FET) with a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2710205

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.