Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2006-01-10
2006-01-10
Brewster, William M. (Department: 2823)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S640000, C438S667000, C438S761000
Reexamination Certificate
active
06984583
ABSTRACT:
A method for forming insulating precursors to via holes formed through conductive and semiconductive substrates includes use of stereolithographic processes. An unconsolidated material is introduced into a precursor hole, then regions of the unconsolidated material that are located adjacent to the surface of each precursor hole are selectively consolidated to form an insulative coating thereon. This process may be conducted once to form a single-layered insulative coating or multiple times to form multilayered insulative coatings. Subsequently, unconsolidated material may be removed to expose a via hole that extends through the insulative coating. Structures that include via holes and conductive vias that have been insulated in this manner are also disclosed, as are systems for forming the insulative coatings.
REFERENCES:
patent: 6251488 (2001-06-01), Miller et al.
patent: 6259962 (2001-07-01), Gothait
patent: 6268584 (2001-07-01), Keicher et al.
patent: 6391251 (2002-05-01), Keicher et al.
patent: 6903443 (2005-06-01), Farnworth et al.
patent: 2002/0171177 (2002-11-01), Kritchman et al.
patent: 2003/0102566 (2003-06-01), Farnworth
patent: 2003/0151167 (2003-08-01), Kritchman et al.
patent: 2004/0043607 (2004-03-01), Farnworth et al.
patent: 2004/0112881 (2004-06-01), Bloemeke et al.
patent: 04-024987 (1992-01-01), None
Miller et al., “Makeless Mesoscale Materials Deposition”, Deposition Technology, Sep. 2001, pp. 20-22.
Miller et al., “New Laser-Directed Deposition Technology”, Microelectronic Fabrication, Aug. 2001, p. 16.
Webpage, Obect Prototyping the Future, “Obect FullCure 700 Series”, 1 page.
Webpage, Objet Prototyping the Future, “How it Works”, 2 pages.
Webpage, Obect Prototyping the Future, “Objet FullCure 700 Series”, 1 page.
Brewster William M.
Micro)n Technology, Inc.
TraskBritt
LandOfFree
Stereolithographic method for forming insulative coatings... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Stereolithographic method for forming insulative coatings..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stereolithographic method for forming insulative coatings... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3588530