Step edge insert ring for etch chamber

Details Step edge insert ring for etch chamber Step edge insert ring for etch chamber

2008-03-04

2008-03-04

Kackar, Ram N. (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With workpiece support

C156S915000, C156S345520, C156S345530, C118S715000, C118S724000, C118S725000, C118S728000

Reexamination Certificate

active

07338578

ABSTRACT:
An insert ring for a wafer support inside a processing chamber for the processing, particularly dry etching, of semiconductor wafer substrates. The insert ring has a generally step-shaped cross-sectional configuration which defines a perpendicular gap or flow space between the insert ring and the wafer support. In the etching of substrates on the wafer support, the perpendicular gap or flow space defines a perpendicular flow path for plasma species. Consequently, flow of heavy plasma species against the outer wall of the wafer support is substantially hindered or reduced to reduce accumulation of polymer material on the inner surface of the insert ring and/or the outer wall of the wafer support.

REFERENCES:
patent: 5529657 (1996-06-01), Ishii
patent: 6284093 (2001-09-01), Ke et al.
patent: 6344105 (2002-02-01), Daugherty et al.
patent: 6464794 (2002-10-01), Park et al.
patent: 6815352 (2004-11-01), Tamura et al.
patent: 2002/0029745 (2002-03-01), Nagaiwa et al.
patent: 2002/0059981 (2002-05-01), Hao et al.
patent: 2003/0029572 (2003-02-01), Kanno et al.
patent: 2003/0066484 (2003-04-01), Morikage et al.
patent: 2003/0106646 (2003-06-01), Ma et al.
patent: 2003/0106647 (2003-06-01), Koshiishi et al.

Affiliated with

Also associated with

Rating

Step edge insert ring for etch chamber does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Step edge insert ring for etch chamber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Step edge insert ring for etch chamber will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2805460