Stencil mask having main and auxiliary strut and method of...

Details Stencil mask having main and auxiliary strut and method of... Stencil mask having main and auxiliary strut and method of...

2008-05-05

2009-12-22

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S296000, C430S313000, C430S314000, C430S316000, C430S317000, C430S319000, C430S320000, C430S942000

Reexamination Certificate

active

07635547

ABSTRACT:
A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an aperture through which particle beams can permeate and non-pattern areas interposed between the pattern areas. A main strut supports the membrane areas and is formed on the border area of the membrane forming thin layer. An auxiliary strut is formed in the non-pattern areas inside the membrane pattern area such that the auxiliary strut divides the membrane areas into plural divided membrane areas. The auxiliary strut supports the divided membrane areas.

REFERENCES:
patent: 6459090 (2002-10-01), Suzuki
patent: 7384711 (2008-06-01), Kim et al.
Office Action issued by the Chinese Patent Office on Jun. 5, 2009 during examination of the corresponding Chinese application No. 2004100598454.

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