Static electricity chuck and wafer stage

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

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Details

118724, 279128, H05B 368, C23C 1600, B23B 522

Patent

active

059819138

ABSTRACT:
There are provided a static electricity chuck which can vary the temperature of a wafer in a short time without adversely effecting throughput, and a wafer stage having the static electricity chuck. The static electricity chuck includes a dielectric member 4 formed of insulating material, an electrode 5 of conductor which is disposed at the lower side of the dielectric member 4, and a heater 6 which is disposed at the lower side of the electrode 5 and heats the dielectric member 4. The wafer stage 1 includes the static electricity chuck which is provided on a metal jacket having cooling apparatus.

REFERENCES:
patent: 5151845 (1992-09-01), Watanabe et al.
patent: 5166856 (1992-11-01), Liporace et al.
patent: 5191506 (1993-03-01), Logan et al.
patent: 5280156 (1994-01-01), Niori et al.
patent: 5374807 (1994-12-01), Yahav et al.
patent: 5663865 (1997-09-01), Kawada et al.

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