Etching a substrate: processes – Gas phase etching of substrate – Etching inorganic substrate
Reexamination Certificate
2011-03-29
2011-03-29
Vinh, Lan (Department: 1713)
Etching a substrate: processes
Gas phase etching of substrate
Etching inorganic substrate
C216S058000, C216S080000, C438S725000, C438S740000
Reexamination Certificate
active
07914693
ABSTRACT:
The present invention relates to a micro
ano imprint lithography technique and in particular, to a stamp that is used in an UV-micro
ano imprint lithography process or thermal micro
ano imprint lithography process and a method for fabricating the stamp.The method for fabricating a stamp for micro
ano imprint lithography of the present invention includes i) depositing a thin film of diamond-like carbon on a substrate, ii) applying resist on the diamond-like carbon thin film, iii) patterning the resist, iv) etching the diamond-like carbon thin film by using the resist as a protective layer, and v) removing the resist.
REFERENCES:
patent: 6858909 (2005-02-01), Cyrille et al.
patent: 7186574 (2007-03-01), Dulay et al.
patent: 2002/0068377 (2002-06-01), Oku et al.
patent: 2002/0098285 (2002-07-01), Hakovirta et al.
patent: 2004/0131963 (2004-07-01), Ohta et al.
patent: 2005/0084804 (2005-04-01), Truskett et al.
patent: 2005/0170292 (2005-08-01), Tsai et al.
patent: 03019154 (1991-01-01), None
patent: 05169459 (1993-07-01), None
patent: 10096808 (1998-04-01), None
patent: 2004130775 (2004-04-01), None
patent: 2004-164689 (2004-06-01), None
patent: 2004311713 (2004-11-01), None
patent: 2005047080 (2005-02-01), None
patent: 2005-193390 (2005-07-01), None
patent: 2006032423 (2006-02-01), None
patent: 10-2004-065752 (2004-07-01), None
patent: WO 01/40537 (2001-06-01), None
Vasilets, V. N., “Characterization of doped diamond-like carbon films deposited by hot wire plasma sputtering of graphite”, Applied Science, vol. A79, No. 8, Dec. 2004, pp. 2079-2084.
Zhu, W., “Novel co-sputtered fluorinated amorphous carbon films for sub-0.25 μm low κ damascene multilevel interconnect applications”, Electron Devices Meeting, 1998. IEDM '98 Technological Digest International, Dec. 6, 1998, pp. 845-848.
Search report from EP 06021860.9-1226, Jun. 11, 2007.
Choi Dae-Geun
Jeong Jun-Ho
Kim Ki-Don
Lee Eung-Sug
Sim Young-Suk
Korea Institute of Machinery & Materials
Pearl Cohen Zedek Latzer LLP
Vinh Lan
LandOfFree
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