Stage controller and exposure method in which position of...

Details Stage controller and exposure method in which position of... Stage controller and exposure method in which position of...

2008-07-25

2009-06-02

Toatley, Jr., Gregory J (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

C356S508000, C355S077000, C430S030000

Reexamination Certificate

active

07542141

ABSTRACT:
An apparatus including a stage configured to be moved. A first laser interferometer measures a position of the stage in a first direction. A second laser interferometer measures a position of the stage in the first direction. A control unit (i) obtains a position of the stage based on an output of one of the first and second laser interferometers, (ii) controls a position of the stage based on the obtained position of the stage, (iii) performs switching of one of the first and second laser interferometers to the other of the first and second laser interferometers while the stage is moved at a constant velocity in the first direction, (iv) calculates a distance by which the stage is to be moved during a time interval, and (v) sets an initial value of the other of the first and second laser interferometers after the switching, based on a position measured by the one of the first and second laser interferometers at a start time of the time interval and the calculated distance.

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Japanese Office Action dated Oct. 6, 2006, issued in corresponding Japanese patent application No. 2002-56419.

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