Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Reexamination Certificate
2006-05-16
2006-05-16
Nguyen, Kiet T. (Department: 2881)
Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
Reexamination Certificate
active
07045794
ABSTRACT:
A micro-electrical system, such as a lens stack for use in a scanning electron microscope, analysis tool, etc., comprises recesses and/or serrations that increase the surface path breakdown, thereby increasing reliability and enabling high voltage operations.
REFERENCES:
patent: 4200794 (1980-04-01), Newberry et al.
patent: 5122663 (1992-06-01), Chang et al.
patent: 5155412 (1992-10-01), Chang et al.
patent: 6288401 (2001-09-01), Chang et al.
patent: 6946662 (2005-09-01), Ono et al.
patent: 6956219 (2005-10-01), Saini et al.
L.P. Muray et al., “Advances in Arrayed Microcolumn Lithography,”J. Vac. Sci. Technol. B, Nov./Dec. 2000, pp. 3099-3104, vol. 18, No. 6, American Vacuum Society, New York, U.S.A.
T.H.P. Chang et al., “Multiple Electron-Beam Lithography,”Microelectronic Engineering, 2001, pp. 117-135, vol. 57-58.
Muray Lawrence
Spallas James
Nguyen Kiet T.
Novelx, Inc.
Squire Sanders & Dempsey L.L.P.
Wininger Aaron
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