Stack having Heusler alloy, magnetoresistive element and...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE29323, C257SE43004

Reexamination Certificate

active

07973351

ABSTRACT:
A stack includes a crystalline MgO layer, crystalline Heusler alloy layer, and amorphous Heusler alloy layer. The crystalline Heusler alloy layer is provided on the MgO layer. The amorphous Heusler alloy layer is provided on the crystalline Heusler alloy layer.

REFERENCES:
patent: 2006/0227465 (2006-10-01), Inokuchi et al.
patent: 2006/0255383 (2006-11-01), Kaiser et al.
patent: 2007/0074317 (2007-03-01), Pakala et al.
patent: 2009/0050948 (2009-02-01), Ishikawa et al.
patent: 2009/0180215 (2009-07-01), Ishikawa et al.
patent: 2006-32915 (2006-02-01), None
patent: 2006-295001 (2006-10-01), None
patent: 2007-250977 (2007-09-01), None
patent: WO 2005/088745 (2005-09-01), None
U.S. Appl. No. 12/561,475, filed Sep. 17, 2009, Tomoaki Inokuchi, et al.
N. Tezuka, et al., “Tunnel magnetoresistance for junctions with epitaxial full-Heusler Co2FeAl0.5Si0.5electrodes withB2 andL21structures”, Applied Physics Letters, vol. 89, 2006, pp. 112514-1 to 112514-3.
Office Action mailed Aug. 17, 2010, in Japanese Patent Application No. 2008-246718 (with English-language Translation).

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