Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-04-08
1999-11-09
Nguyen, Nam
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302711, 4302861, 4302751, 522 85, G03F 733
Patent
active
059811471
ABSTRACT:
Disclosed are waterborne, stable photoresist compositions and methods of their preparation and use. The compositions are characterized by increased shear and storage stability. The photoresist composition comprises an aqueous emulsion of a 22% or less neutralized carboxylated resin and non-ionic surfactant containing poly(ethylene-oxide) segments, photopolymerizable monomer and photoinitiator. Neutralization is accomplished using either an organic or an inorganic base or mixtures thereof. The photoresist compositions are useful to selectively coat and protect surfaces subjected to corrosive environments, e.g., etchant processes, in the production of circuit traces for electronic circuit boards.
REFERENCES:
patent: 5045435 (1991-09-01), Adams et al.
patent: 5115031 (1992-05-01), Heim et al.
patent: 5364737 (1994-11-01), Barr
patent: 5387494 (1995-02-01), Barr et al.
patent: 5389495 (1995-02-01), Barr
patent: 5393643 (1995-02-01), Lundy et al.
patent: 5411837 (1995-05-01), Bottomley et al.
patent: 5439766 (1995-08-01), Day et al.
patent: 5576145 (1996-11-01), Keil et al.
patent: 5609991 (1997-03-01), Briguglio et al.
Becknell Alan Frederick
Ebner Cynthia Louise
Hallock John Scott
Hart Daniel Joseph
Cordani John L.
Mac Dermid Incorporated
Nguyen Nam
Ver Steeg Steven H.
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