Stabilized choline base solutions

Details Stabilized choline base solutions Stabilized choline base solutions

1986-07-18

1987-08-11

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 2, 134 34, 134 42, 156637, 156656, 156655, 156665, 156668, 252 795, 252156, C23F 102, B44C 122, C09K 1302, B29C 3700

Patent

active

046860029

ABSTRACT:
Solutions of choline base, (2-hydroxyethyl)trimethylammonium hydroxide, in water and/or lower alkanols may be stabilized by the addition of a stabilizing concentration of formaldehyde or paraformaldehyde. The stabilized solutions may be used as cleaning solutions, etchants for semiconductors and metal layers, and developers and strippers for positive working photoresists, and for other uses where a metal ion-free base is desired.

REFERENCES:
patent: 2823166 (1958-02-01), Hoffman
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patent: 3897485 (1975-07-01), Meunier
patent: 3947491 (1976-03-01), Kelly et al.
patent: 4172005 (1979-10-01), Muraoka et al.
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patent: 4294911 (1981-10-01), Guild
patent: 4339340 (1982-07-01), Muraoka et al.
patent: 4425202 (1984-01-01), Sullivan
patent: 4439454 (1984-03-01), Riva
patent: 4464461 (1984-08-01), Guild
"The Merck Index", 9th ed. (1976), Merck & Co., Rahway, N.J., items 4095 and 6831.

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