Static information storage and retrieval – Systems using particular element – Flip-flop
Reexamination Certificate
2002-04-05
2004-04-20
Nguyen, Tan T. (Department: 2818)
Static information storage and retrieval
Systems using particular element
Flip-flop
C365S227000
Reexamination Certificate
active
06724648
ABSTRACT:
TECHNICAL FIELD
This invention relates to static random access memories (SRAMs), and more particularly to reducing active leakage power in SRAMs.
BACKGROUND
An SRAM cell may be implemented using a bistable flipflop. The flipflop includes, for example, two load elements, two storage transistors, and two access transistors. A direct current (DC) supply voltage is applied to the flipflop to retain data stored by the flipflop. The flipflop may be implemented using metal oxide semiconductor (MOS) or bipolar transistors.
As shown in 
FIG. 1
, a conventional, full complementary MOS (CMOS) SRAM cell 
100
 includes six transistors. Pull-up transistors 
101
 and 
102
 may be implemented using, for example, p-channel MOS (PMOS) transistors. Access transistors 
103
 and 
104
 and storage transistors 
105
 and 
106
 may be implemented using, for example, n-channel MOS (NMOS) transistors.
The drains of the pull-up transistors 
101
 and 
102
 are connected to a source line 
110
. The source line 
110
 is connected to a DC supply voltage V
DD
.
Nodes 
120
 and 
122
 store a potential that indicates a state of the cell 
100
. If the potential stored at node 
120
 is high, then the potential at node 
122
 is low. Conversely, if the potential at node 
122
 is high, then the potential at node 
120
 is low. The DC supply voltage V
DD 
is applied to the sources of the pull up transistors 
101
 and 
102
 to retain the potentials stored at the nodes 
120
 and 
122
. The two stable states stored at the nodes 
120
 and 
122
 may be defined as a logic ‘1’ and a logic ‘0.’
The gates of the access transistors 
103
 and 
104
 are connected to a word line 
115
. The drains of the access transistors 
103
 and 
104
 are connected to the bit lines 
140
 and 
142
, respectively. The sources of the access transistors 
103
 and 
104
 are connected to the nodes 
120
 and 
122
, respectively. A high potential on the write line 
115
 turns on transistors 
103
 and 
104
 to connect nodes 
120
 and 
122
 to the bit lines 
140
 and 
142
, so that the nodes 
102
 and 
122
 may be accessed.
One problem associated with SRAMs is active power leakage. If the cell 
100
 is in an active mode (i.e., the source line 
110
 of the cell 
100
 is maintained at the supply voltage V
DD
), several leakage currents result. For example, if a cell 
100
 has a high potential stored at node 
120
 and a low potential at node 
122
, then gate oxide leakage currents occur, as shown by the dotted arrows in FIG. 
1
. In addition, sub-threshold leakage currents occur in transistors 
102
 and 
105
, as shown by the solid bold arrows in FIG. 
1
.
Individually, the active power leakage of one cell 
100
 is relatively small. However, an SRAM array may include millions of cells 
100
. Taken as a whole, the leakage currents of multiple cells may result in substantial active power leakage for the array. Although some gate oxide power leakage and sub-threshold power leakage may be tolerated in SRAMS, as the number of SRAM cells 
100
 in an array continues to increase, active power leakage is only compounded. In addition, with each new generation of SRAMs, the physical size of the cells 
100
 is reduced to enable more cells 
100
 to be placed in an array. As the size of the cells 
100
 is reduced, there is a corresponding reduction in the thickness of the gate oxide layer. As the gate oxide layer becomes thinner, active gate oxide power leakage increases further compounding the problem in SRAMs.
REFERENCES:
patent: 5297098 (1994-03-01), Nakatani et al.
patent: 5303190 (1994-04-01), Pelley, III
patent: 5644546 (1997-07-01), Furumochi et al.
patent: 5668770 (1997-09-01), Itoh et al.
patent: 6307803 (2001-10-01), Chien
Koji Nii, et al., “A Low-Power SRAM using Auto-Back gate-Controlled (ABC) MT-CMOS”, 1998 IEEE/ACM International Symposium on Low-Power and Electronics Design, Aug. 1998, Monterey CA pp. 293-298.
De Vivek
Khellah Muhammad
Somasekhar Dinesh
Ye Yibin
Intel Corporation
Nguyen Tan T.
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