SRAM array with dynamic voltage for reducing active leakage...

Static information storage and retrieval – Systems using particular element – Flip-flop

Reexamination Certificate

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C365S227000

Reexamination Certificate

active

06724648

ABSTRACT:

TECHNICAL FIELD
This invention relates to static random access memories (SRAMs), and more particularly to reducing active leakage power in SRAMs.
BACKGROUND
An SRAM cell may be implemented using a bistable flipflop. The flipflop includes, for example, two load elements, two storage transistors, and two access transistors. A direct current (DC) supply voltage is applied to the flipflop to retain data stored by the flipflop. The flipflop may be implemented using metal oxide semiconductor (MOS) or bipolar transistors.
As shown in
FIG. 1
, a conventional, full complementary MOS (CMOS) SRAM cell
100
includes six transistors. Pull-up transistors
101
and
102
may be implemented using, for example, p-channel MOS (PMOS) transistors. Access transistors
103
and
104
and storage transistors
105
and
106
may be implemented using, for example, n-channel MOS (NMOS) transistors.
The drains of the pull-up transistors
101
and
102
are connected to a source line
110
. The source line
110
is connected to a DC supply voltage V
DD
.
Nodes
120
and
122
store a potential that indicates a state of the cell
100
. If the potential stored at node
120
is high, then the potential at node
122
is low. Conversely, if the potential at node
122
is high, then the potential at node
120
is low. The DC supply voltage V
DD
is applied to the sources of the pull up transistors
101
and
102
to retain the potentials stored at the nodes
120
and
122
. The two stable states stored at the nodes
120
and
122
may be defined as a logic ‘1’ and a logic ‘0.’
The gates of the access transistors
103
and
104
are connected to a word line
115
. The drains of the access transistors
103
and
104
are connected to the bit lines
140
and
142
, respectively. The sources of the access transistors
103
and
104
are connected to the nodes
120
and
122
, respectively. A high potential on the write line
115
turns on transistors
103
and
104
to connect nodes
120
and
122
to the bit lines
140
and
142
, so that the nodes
102
and
122
may be accessed.
One problem associated with SRAMs is active power leakage. If the cell
100
is in an active mode (i.e., the source line
110
of the cell
100
is maintained at the supply voltage V
DD
), several leakage currents result. For example, if a cell
100
has a high potential stored at node
120
and a low potential at node
122
, then gate oxide leakage currents occur, as shown by the dotted arrows in FIG.
1
. In addition, sub-threshold leakage currents occur in transistors
102
and
105
, as shown by the solid bold arrows in FIG.
1
.
Individually, the active power leakage of one cell
100
is relatively small. However, an SRAM array may include millions of cells
100
. Taken as a whole, the leakage currents of multiple cells may result in substantial active power leakage for the array. Although some gate oxide power leakage and sub-threshold power leakage may be tolerated in SRAMS, as the number of SRAM cells
100
in an array continues to increase, active power leakage is only compounded. In addition, with each new generation of SRAMs, the physical size of the cells
100
is reduced to enable more cells
100
to be placed in an array. As the size of the cells
100
is reduced, there is a corresponding reduction in the thickness of the gate oxide layer. As the gate oxide layer becomes thinner, active gate oxide power leakage increases further compounding the problem in SRAMs.


REFERENCES:
patent: 5297098 (1994-03-01), Nakatani et al.
patent: 5303190 (1994-04-01), Pelley, III
patent: 5644546 (1997-07-01), Furumochi et al.
patent: 5668770 (1997-09-01), Itoh et al.
patent: 6307803 (2001-10-01), Chien
Koji Nii, et al., “A Low-Power SRAM using Auto-Back gate-Controlled (ABC) MT-CMOS”, 1998 IEEE/ACM International Symposium on Low-Power and Electronics Design, Aug. 1998, Monterey CA pp. 293-298.

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