Sputtering target supporting device

Details Sputtering target supporting device Sputtering target supporting device

1984-04-25

1984-11-27

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044850000

ABSTRACT:
In a sputtering target supporting device for fixing, to a common electrode, a plurality of beams forming a mosaic target used for co-sputtering, at least one pressing mechanism is provided exclusively for each of the beams to press the respective beam against the common electrode by means of the respective pressing mechanism provided therefor.

REFERENCES:
Gambino et al., IBM Technical Disc. Bull., 22, (1979), pp. 1228-1229.
Lue, Vacuum, 32, (1982), pp. 363-365.
Vossen et al., Thin Film Processes; Academic Press, N.Y., N.Y., 1978, pp. 41-42.

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