Sputtering target producing few particles

Details Sputtering target producing few particles Sputtering target producing few particles

2005-04-05

2005-04-05

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

Reexamination Certificate

active

06875325

ABSTRACT:
A sputtering target having a sprayed coating at least on the side face thereof and producing few particles. The deposit produced on the side face of the sputtering target is prevented from separating and flying.

REFERENCES:
patent: 5863398 (1999-01-01), Kardokus et al.
patent: 07-126841 (1995-05-01), None
patent: 08-176816 (1996-07-01), None
patent: 09-143706 (1997-06-01), None
patent: 09-272965 (1997-10-01), None
patent: 10-030174 (1998-02-01), None
patent: 11-236663 (1999-08-01), None
Patent Abstracts of Japan, One page English Abstract of JP 10-030174.
Patent Abstracts of Japan, One page English Abstract of JP 11-236663.
Patent Abstracts of Japan, One page English Abstract of JP 09-143706.
Patent Abstracts of Japan, One page English Abstract of JP 07-126841.
Patent Abstracts of Japan, One page English Abstract of JP 08-176816.

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