Sputtering target material

Details Sputtering target material Sputtering target material

2011-06-14

2011-06-14

King, Roy (Department: 1733)

Metal treatment

Stock

Noble metal base

C420S505000

Reexamination Certificate

active

07959746

ABSTRACT:
This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.

REFERENCES:
patent: 2310231 (1943-02-01), Goldsmith
patent: 2450340 (1948-09-01), Hensel et al.
patent: 2719085 (1955-09-01), Schatz
patent: 5338646 (1994-08-01), Nakayama et al.
patent: 6841012 (2005-01-01), Croce
patent: 0 849 727 (1998-06-01), None
patent: 59-86218 (1984-05-01), None
patent: 61-133350 (1986-06-01), None
patent: 62-112742 (1987-05-01), None
patent: 4-358032 (1992-12-01), None
patent: 2002-319185 (2002-10-01), None
patent: 2004-192702 (2004-07-01), None
patent: 2004-263290 (2004-09-01), None
patent: 2004-331990 (2004-11-01), None
“ASM Handbooks Online”, vol. 5 Surface Engineering, http://products.asminternational.org/hbk/index.jsp, 2002.
Supplementary European Search Report issued Aug. 8, 2008 in connection with European Application No. 04 79 2511.0 corresponding to the present U.S. application.

Affiliated with

Also associated with

Rating

Sputtering target material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sputtering target material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sputtering target material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2622740