Sputtering target

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

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Details

20419212, 501 88, 501 98, 501152, 264 41, 264 63, 264 65, C23C 1400, C04B 3552, C04B 3550, C04B 3564

Patent

active

054784565

ABSTRACT:
Electrically conductive sputtering target comprising yttria and amorphous carbon, a method of making the same, and a method of using the same.

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