Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-05-08
1987-08-04
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, C23C 1442
Patent
active
046844546
ABSTRACT:
A triode vacuum sputtering process, and vacuums in the range of 4.times.10.sup.-3 to 6.times.10.sup.-4 Torr are used to obtain amorphous rate earth/transition metal alloy thin films useful as magneto optic media. By adjusting process parameters such as substrate temperature, anode bias and deposition rate, the properties of the thin film can be altered.
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Little Douglas B.
Minnesota Mining and Manufacturing Company
Nguyen Nam X.
Niebling John F.
Sell Donald M.
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