Sputtering method of making thin film head having improved satur

Details Sputtering method of making thin film head having improved satur Sputtering method of making thin film head having improved satur

1986-07-28

1987-11-10

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 20419232, 20419235, 20419237, C23C 1434

Patent

active

047056134

ABSTRACT:
It has been found that, if a (negative) bias is applied to a substrate during the sputtering thereto of Alfesil, selective re-sputtering from the substrate film of aluminum and silicon will leave that film rich in iron and, attendantly, of higher saturation magnetization (17,000 gauss) than the starting material Alfesil (10,000 gauss). Such being the case, the invention provides that the sputtering of Alfesil-type material during the manufacture of a magnetic head be performed in two phases, first, while applying a bias of a first sense to a substrate to be sputtered upon, and, second, while applying a bias of different sense (e.g. a zero bias) to the substrate, thereby to cause a composite thin film to be formed on the substrate. The composition of the thin film in question is: 1. a (generally thin) region of material of high saturation magnetization layered with 2. a (generally thicker) region of lesser saturation magnetization.

REFERENCES:
patent: 3451912 (1969-06-01), D'heurle et al.
patent: 4036723 (1977-07-01), Schwartz et al.
patent: 4336118 (1982-06-01), Patten et al.
patent: 4410407 (1983-10-01), Macaulay
patent: 4468437 (1984-08-01), Patten et al.
H. Shibaya et al., "Preparation . . . Head Core", IEEE Transactions on Magnetics, vol. Mag-13, No. 4, 7/77, pp. 1029-1035.
Maissel et al., "Handbook . . . Technology", McGraw Hill Book Co., 1970, pp. 4-22 to 4-24.

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