Pumps – Electrical or getter type – Ionic with gettering
Patent
1980-02-15
1982-06-15
Freeh, William L.
Pumps
Electrical or getter type
Ionic with gettering
316 13, 316 32, 417 53, F04B 3702
Patent
active
043348297
ABSTRACT:
A sputter-ion pump for use in combination with an electron tube having at least one thoriated tungsten cathode comprises a vacuum envelope and a getter-cathode within the envelope. The getter cathode comprises a first cathode member consisting of at least one reactive material selected from the group consisting of titanium, zirconium, thorium, tantalum, niobium and vanadium. A second cathode member, consisting, e.g., of a reactive material and carbon, provides a recarburizing atmosphere for forming, in situ, a tungsten carbide layer on the thoriated tungsten cathode of the electron tube so as to increase the life of the electron tube.
REFERENCES:
patent: 1854926 (1932-04-01), De Broske
patent: 2988265 (1961-06-01), Reich
patent: 2988657 (1961-06-01), Klopfer et al.
patent: 2993638 (1961-07-01), Hall et al.
patent: 3094639 (1963-06-01), Jepsen
patent: 3152752 (1964-10-01), Vanderslice
patent: 3240569 (1966-03-01), Buescher
patent: 3244933 (1966-04-01), Schmidt et al.
patent: 3542488 (1970-11-01), Hall
patent: 3542488 (1970-11-01), Hall
patent: 3780501 (1973-12-01), Della Porta et al.
Coughlin Jr. Vincent J.
Freeh William L.
Irlbeck Dennis H.
Look Edward
RCA Corporation
LandOfFree
Sputter-ion pump for use with electron tubes having thoriated tu does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sputter-ion pump for use with electron tubes having thoriated tu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sputter-ion pump for use with electron tubes having thoriated tu will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1917165