Sputter cathode

Details Sputter cathode Sputter cathode

1998-12-08

2000-10-31

Chaney, Carol

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429817, 20429819, C23C 1434

Patent

active

061397067

ABSTRACT:
In a sputter cathode with a plate-shaped target (8) and with a trough-shaped yoke (3), arranged behind the target (8), with middle web (5) and with magnets (7, 7', . . . ) for producing a closed tunnel of field lines (15, 15', . . . ) curved in an arc in front of the target surface as well as with three sheet-metal blanks (9, 10, 11) consisting of one layer of a compound plate e.g. of an aluminum/iron compound plate, which blanks are placed into the plane between the target (8) and the front surfaces (12, 13) of the trough edge of the yoke (3), which front surfaces face the target (8), all sheet-metal blanks (9, 10, 11) of magnetically conductive material together form gaps (a, a') extending approximately parallel to the front surfaces (12, 13), which gaps (a, a') are filled out between the sheet-metal blanks (9, 10, 11) by the other layer (21) of the compound plate.

REFERENCES:
patent: 4405436 (1983-09-01), Kobayashi et al.
patent: 4525262 (1985-06-01), Class et al.
patent: 4572021 (1986-02-01), Aichert et al.
patent: 4865708 (1989-09-01), Welty
patent: 4964968 (1990-10-01), Arita
patent: 5415754 (1995-05-01), Manley

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