Sputter cathode

Details Sputter cathode Sputter cathode

1995-02-23

1996-07-02

Breneman, R. Bruce

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429813, C23C 1434

Patent

active

055318762

ABSTRACT:
The target (5) of a sputter cathode 3 is permanently bonded to a metallic backing plate (14, 15) with a coefficient of thermal expansion similar to that of the target (5). This backing plate (14, 15) is held removably on the electrode (4), for example by means of spring clips (16, 17).

REFERENCES:
patent: 4444643 (1984-04-01), Garnett
patent: 4885075 (1989-12-01), Hillman
patent: 5203980 (1993-04-01), Cremer et al.
patent: 5269403 (1993-12-01), Pouliquen
patent: 5372694 (1994-12-01), Szczyrbowski

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