Etching a substrate: processes – Forming or treating an article whose final configuration has...
Reexamination Certificate
2005-10-25
2005-10-25
Font, Frank G. (Department: 2883)
Etching a substrate: processes
Forming or treating an article whose final configuration has...
C216S002000, C250S306000, C250S307000, C250S309000, C250S310000
Reexamination Certificate
active
06958124
ABSTRACT:
SPM sensor comprising a holding element, cantilever and a sensor tip, which projects out of the surface of the cantilever, at the free end of the cantilever, at least the cantilever and the three-surface sensor tip consisting of monocrystalline (100)-silicon, and a process for producing this sensor. The process is distinguished by inexpensive process steps, substantially wet-chemical etching steps. The result is that an SPM sensor with a rectangular cantilever arm having a tip which may or may not project beyond the free end is produced from a single piece.
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Bachman & LaPointe P.C.
El-Shammaa Mary
Font Frank G.
NanoWorld AG
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