Split-phase chamber modeling for chamber matching and fault...

Data processing: structural design – modeling – simulation – and em – Simulating nonelectrical device or system

Reexamination Certificate

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C700S108000

Reexamination Certificate

active

07624003

ABSTRACT:
In at least one embodiment, the present invention is a method for thin-film process chamber data analysis, which includes acquiring chamber data, defining an adjustment portion of the chamber data and a steady-state portion of the chamber data, and forming a chamber model having an adjustment portion and a steady-state portion. The method can further include comparing the chamber model with a subject chamber to provide a chamber data comparison and utilizing the chamber data comparison.

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