Split magnet ring on a magnetron sputter chamber

Details Split magnet ring on a magnetron sputter chamber Split magnet ring on a magnetron sputter chamber

2005-09-02

2009-11-17

Nguyen, Nam X (Department: 1795)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298170, C204S298200, C204S298130

Reexamination Certificate

active

07618521

ABSTRACT:
A split magnet ring, particularly useful in a magnetron plasma reactor sputter depositing tantalum or tungsten or other barrier metal into a via and also resputter etching the deposited material from the bottom of the via onto the via sidewalls. The magnet ring includes two annular magnet rings composed of the same axial polarity separated by a non-magnetic spacing of at least the axial length of one magnet and associated poles. A small unbalanced magnetrons rotates about the back of the target having an outer pole of the same polarity as the ring magnets surrounding a weaker inner pole of the opposite pole.

REFERENCES:
patent: 4925542 (1990-05-01), Kidd
patent: 5415754 (1995-05-01), Manley
patent: 6014943 (2000-01-01), Arami et al.
patent: 6406599 (2002-06-01), Subramani et al.
patent: 6610184 (2003-08-01), Ding et al.
patent: 2004/0094509 (2004-05-01), Miyata et al.

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