Spin on glass material and method for forming a semiconductor de

Details Spin on glass material and method for forming a semiconductor de Spin on glass material and method for forming a semiconductor de

1996-03-21

1999-04-06

Brunsman, David

Compositions: coating or plastic

Coating or plastic compositions

Silicon containing other than solely as silicon dioxide or...

C09D18304

Patent

active

058912347

ABSTRACT:
A spin on glass composition which includes in a solvent as a main component alkoxysilane represented by H.sub.n Si(OR).sub.4-n, where n is 1, 2, or 3 and R is an alkyl group. Water or alcohol is available as a solvent. It is preferable to add the above alkoxysilane with at least any one of a phosphorus compound, boron compound and a germanium compound. It is also preferable to add the above alkoxysilane not only with tetraalkoxysilane Si(OR).sub.4, where R is an alkyl group, but also with at least any one of phosphorus compound, boron compound and germanium compound.

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patent: 5472488 (1995-12-01), Allman
patent: 5496402 (1996-03-01), Sakamoto et al.
CA 111:105916, Miura et al, "Optical information recording media", Feb. 17, 1989.
CA 126:41301, Kaynagi et al, "SOG material and manufacture of semiconductor device", Jan. 11, 1996.
CA 105:71386, Hoshino et al, "Silicon oxide coating on magnetic disk", Mar. 22, 1986.

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