Spin-on-glass etchback uniformity improvement using hot backside

Details Spin-on-glass etchback uniformity improvement using hot backside Spin-on-glass etchback uniformity improvement using hot backside

1998-03-09

2000-02-15

Gulakowski, Randy

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

216 53, 118708, 118 44, 118725, 118 58, 438715, C23F 102

Patent

active

060248289

ABSTRACT:
A workpiece with a back surface and a front surface has a layer formed on the front surface thereof which is to be etched by plasma etching. The workpiece is placed on a lower electrode in a plasma etching system with the back surface resting on the lower electrode. The workpiece is clamped to the lower electrode. A gas circulation system is formed in the surface of the lower electrode to supply heated gas, under pressure, to the back surface of a workpiece placed thereon to cause the workpiece to bow thereby forming a vaulted space below the workpiece. Then, while heating the back of the workpiece in this way, plasma etching of the layer upon the workpiece is performed.

REFERENCES:
patent: 4508161 (1985-04-01), Holden
patent: 4775550 (1988-10-01), Chu et al.
patent: 5228501 (1993-07-01), Tepman et al.
patent: 5695566 (1997-12-01), Suzuki et al.
patent: 5725718 (1998-03-01), Banholzer et al.
patent: 5874012 (1999-02-01), Kanai et al.

Affiliated with

Also associated with

Rating

Spin-on-glass etchback uniformity improvement using hot backside does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Spin-on-glass etchback uniformity improvement using hot backside, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Spin-on-glass etchback uniformity improvement using hot backside will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1902743