Spin MOSFET

Static information storage and retrieval – Systems using particular element – Magnetoresistive

Reexamination Certificate

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C365S171000, C365S173000, C257S295000

Reexamination Certificate

active

07602636

ABSTRACT:
A spin MOSFET includes: a semiconductor substrate; a first magnetic film formed on the semiconductor substrate and including a first ferromagnetic layer, a magnetization direction of the first ferromagnetic layer being pinned; a second magnetic film formed on the semiconductor substrate to separate from the first magnetic film and including a magnetization free layer, a first nonmagnetic layer being a tunnel insulator and provided on the magnetization free layer, and a magnetization pinned layer provided on the first nonmagnetic layer, a magnetization direction of the magnetization free layer being changeable and a magnetization direction of the magnetization pinned layer being fixed; a gate insulating film provided at least on the semiconductor substrate between the first magnetic film and the second magnetic film; and a gate electrode formed on the gate insulating film.

REFERENCES:
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patent: 2004-207707 (2004-07-01), None
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Satoshi Sugahara et al., “A spin metal-oxide-semiconductor field-effect transistor using half-metallic-ferromagnet contacts for the source and drain”, Applied Physics Letters, vol. 84, No. 13, Mar. 29, 2004, pp. 2307-2309.
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D. Chiba et al, “Magnetization vector manipulation by electric fields,” Nature, vol. 455, pp. 515-518, Sep. 25, 2008.

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