Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-11-02
2009-10-27
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S271100, C430S272100, C430S325000, C430S326000, C430S950000
Reexamination Certificate
active
07608380
ABSTRACT:
Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers are copolymers of a compound having the formulasand a compound having the formulawhere: (1) each R is individually selected from the group consisting of —OH, —NH2, hydrogen, aliphatics, and phenyls; and (2) L is selected from the group consisting of —SO2— and —CR′2—. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.
REFERENCES:
patent: 4667010 (1987-05-01), Eldin
patent: 4742152 (1988-05-01), Scola
patent: 4803147 (1989-02-01), Mueller et al.
patent: 4910122 (1990-03-01), Arnold et al.
patent: 4927736 (1990-05-01), Mueller et al.
patent: 5057399 (1991-10-01), Flaim et al.
patent: 5089593 (1992-02-01), Fjare et al.
patent: 5304626 (1994-04-01), Burgess et al.
patent: 5336925 (1994-08-01), Moss et al.
patent: 5340684 (1994-08-01), Hayase et al.
patent: 5397684 (1995-03-01), Hogan et al.
patent: 5688987 (1997-11-01), Meador et al.
patent: 5772925 (1998-06-01), Watanabe et al.
patent: 5892096 (1999-04-01), Meador et al.
patent: 5952448 (1999-09-01), Lee et al.
patent: 5998569 (1999-12-01), Hogan et al.
patent: 6162580 (2000-12-01), Matsuoka et al.
patent: 6455416 (2002-09-01), Subramanian et al.
patent: 7265431 (2007-09-01), Sivakumar
patent: 2002/0120091 (2002-08-01), Scott
patent: 2002/0160211 (2002-10-01), Kurita et al.
patent: 2003/0049566 (2003-03-01), Sabnis et al.
patent: 2004/0010062 (2004-01-01), Ahn et al.
patent: 48000891 (1973-01-01), None
patent: 9-78031 (1997-03-01), None
patent: 10307394 (1998-11-01), None
Ho et al (“Synthesis and Characteristics of Organic Soluble Photoactive Polyimides”, Journal of Applied Polymer Science, vol. 53, p. 1513-1524 (1994).
Cox Robert Christian
Neef Charles J.
Brewer Science Inc.
Hovey & Williams, LLP
Lee Sin J.
LandOfFree
Spin bowl compatible polyamic acids/imides as wet... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Spin bowl compatible polyamic acids/imides as wet..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Spin bowl compatible polyamic acids/imides as wet... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4083370