Spin bowl compatible polyamic acids/imides as wet...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S325000, C430S905000

Reexamination Certificate

active

10180624

ABSTRACT:
Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment the polymers of the composition include recurring monomers having the formulaswhere: (1) each R is individually selected from the group consisting of hydrogen, —OH, aliphatics, and phenyls; and (2) L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

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DN 78:112161 CAplus abstract of JP 48000891, Jan. 1993.
Derwent abstract of JP 48-891.
Translation of JP Pub No. JP 10307394.

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