SPER Device for material working

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118620, 118715, 156646, 156656, 156345, 204192R, 204192E, 204298, 372 62, 427 38, H01L 21306, C23F 100, B05D 306, B05B 502

Patent

active

044117337

ABSTRACT:
A segmented plasma excitation and recombination (SPER) device is employed in a deposition scheme in which the plasma generated in the gap between adjacent electrodes is formed into a beam of ions/atoms by flowing a background gas through the gap. The beam strikes a workpiece and deposits a layer of the vaporized electrode material thereon. Also described are techniques where the ions react with workpiece or the background gas to form a layer, as well as where the ions bombard the workpiece to etch away a layer.

REFERENCES:
patent: 3479269 (1969-11-01), Byrnes et al.
patent: 4123316 (1978-10-01), Tsuchimoto
patent: 4201645 (1980-05-01), Riegert
patent: 4336506 (1982-06-01), Silfvast et al.
Thin Film Technology by Robert W. Berry et al., 1968, pp. 3-11, 156-157 and 204-208.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

SPER Device for material working does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with SPER Device for material working, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and SPER Device for material working will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-711373

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.