Speculative sense enable tuning apparatus and associated...

Static information storage and retrieval – Read/write circuit – Signals

Reexamination Certificate

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C365S194000, C365S210100, C711S167000

Reexamination Certificate

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07577049

ABSTRACT:
A computer memory includes a sense enable control module for generating a sense enable signal for a memory core. The sense enable control module includes an active side for transmitting the sense enable signal for the memory core, and a calibration side for determining when the sense enable signal is to be transmitted by the active side. Both the active side and the calibration side are defined to receive a timing signal. The active side is defined to transmit a delayed version of the timing signal as the sense enable signal for the memory core. The calibration side is defined to adjust the delay amount associated with the delayed version of the timing signal to be transmitted by the active side based on a determined sufficiency of the delay amount.

REFERENCES:
patent: 4197555 (1980-04-01), Uehara et al.
patent: 5378649 (1995-01-01), Huang
patent: 5581098 (1996-12-01), Chang
patent: 5682323 (1997-10-01), Pasch et al.
patent: 5684733 (1997-11-01), Wu et al.
patent: 5825203 (1998-10-01), Kusunoki et al.
patent: 5841663 (1998-11-01), Sharma et al.
patent: 5847421 (1998-12-01), Yamaguchi
patent: 5883841 (1999-03-01), Wendell
patent: 5898194 (1999-04-01), Gheewala
patent: 5908827 (1999-06-01), Sirna
patent: 5923059 (1999-07-01), Gheewala
patent: 5935763 (1999-08-01), Caterer et al.
patent: 5977305 (1999-11-01), Wigler et al.
patent: 6100025 (2000-08-01), Wigler et al.
patent: 6174742 (2001-01-01), Sudhindranath et al.
patent: 6182272 (2001-01-01), Andreev et al.
patent: 6194252 (2001-02-01), Yamaguchi
patent: 6194912 (2001-02-01), Or-Bach
patent: 6240542 (2001-05-01), Kapur
patent: 6255600 (2001-07-01), Schaper
patent: 6275973 (2001-08-01), Wein
patent: 6331733 (2001-12-01), Or-Bach et al.
patent: 6333889 (2001-12-01), Arimoto
patent: 6338972 (2002-01-01), Sudhindranath et al.
patent: 6416907 (2002-07-01), Winder et al.
patent: 6425117 (2002-07-01), Pasch et al.
patent: 6476493 (2002-11-01), Or-Bach et al.
patent: 6480989 (2002-11-01), Chan et al.
patent: 6505327 (2003-01-01), Lin
patent: 6525350 (2003-02-01), Kinoshita et al.
patent: 6536028 (2003-03-01), Katsioulas et al.
patent: 6571140 (2003-05-01), Wewalaarachchi et al.
patent: 6590289 (2003-07-01), Shively
patent: 6591207 (2003-07-01), Naya et al.
patent: 6620561 (2003-09-01), Winder et al.
patent: 6661041 (2003-12-01), Keeth
patent: 6691297 (2004-02-01), Misaka et al.
patent: 6714903 (2004-03-01), Chu et al.
patent: 6737199 (2004-05-01), Hsieh
patent: 6745372 (2004-06-01), Cote et al.
patent: 6792593 (2004-09-01), Takashima et al.
patent: 6795952 (2004-09-01), Stine et al.
patent: 6807663 (2004-10-01), Cote et al.
patent: 6819136 (2004-11-01), Or-Bach
patent: 6834375 (2004-12-01), Stine et al.
patent: 6850854 (2005-02-01), Naya et al.
patent: 6854100 (2005-02-01), Chuang et al.
patent: 6877144 (2005-04-01), Rittman et al.
patent: 6884712 (2005-04-01), Yelehanka et al.
patent: 6904582 (2005-06-01), Rittman et al.
patent: 6928635 (2005-08-01), Pramanik et al.
patent: 6931617 (2005-08-01), Sanie et al.
patent: 6953956 (2005-10-01), Or-Bach et al.
patent: 6978437 (2005-12-01), Rittman et al.
patent: 6992925 (2006-01-01), Peng
patent: 7028285 (2006-04-01), Cote et al.
patent: 7041568 (2006-05-01), Goldbach et al.
patent: 7064068 (2006-06-01), Chou et al.
patent: 7093228 (2006-08-01), Andreev et al.
patent: 7103870 (2006-09-01), Misaka et al.
patent: 7120882 (2006-10-01), Kotani et al.
patent: 7137092 (2006-11-01), Maeda
patent: 7149999 (2006-12-01), Kahng et al.
patent: 7155689 (2006-12-01), Pierrat et al.
patent: 7278118 (2007-10-01), Pileggi et al.
patent: 2003/0042930 (2003-03-01), Pileggi et al.
patent: 2004/0078510 (2004-04-01), Spriggs et al.
patent: 2004/0145028 (2004-07-01), Matsumoto et al.
patent: 2004/0161878 (2004-08-01), Or-Bach et al.
patent: 2004/0243966 (2004-12-01), Dellinger
patent: 2005/0055828 (2005-03-01), Wang et al.
patent: 2005/0101112 (2005-05-01), Rueckes et al.
patent: 2005/0189614 (2005-09-01), Ihme et al.
patent: 2005/0224982 (2005-10-01), Kemerling et al.
patent: 2006/0069894 (2006-03-01), Hollis et al.
patent: 2006/0112355 (2006-05-01), Pileggi et al.
patent: 2006/0121715 (2006-06-01), Chang et al.
patent: 2006/0151810 (2006-07-01), Ohshige
patent: 2006/0223302 (2006-10-01), Chang et al.
patent: 2008/0144361 (2008-06-01), Wong
patent: WO 2006/014849 (2006-02-01), None
U.S. Appl. No. 60/625,342, filed May 25, 2006, Pileggi et al.
Wang, J. et al., Standard Cell Layout with Regular Contact Placement, IEEE Trans. on Semicon. Mrg., vol. 17, No. 3, Aug. 2004.
Kang, S.M., Metal-Metal Matrix (M3) for High-Speed MOS VLSI Layout, IEEE Trans. on CAD, vol. CAD-6, No. 5, Sep. 1987.
Liebmann, L. W., Layout Impact of Resolution Enhancement Techniques: Impediment or Opportunity?, International Symposium on Physical Design, 2003.
Jhaveri, T. et al., Maximization of Layout Printability/Manufacturability by Extreme Layout Regularity, Proc. of the SPIE, Apr. 2006.
Acar, et al., “A Linear-Centric Simulation Framework for Parametric Fluctuations”, 2002, IEEE, Carnegie Mellon University USA, pp. 1-8.
Amazawa, et al., “Fully Planarized Four-Level Interconnection with Stacked VLAS Using CMP of Selective CVD-A1 and Insulator and its Application to Quarter Micron Gate Array LSIs”, 1995, IEEE, Japan, pp. 473-476.
Burkhardt, et al., “Dark Field Double Dipole Lithography (DDL) for Back-End-Of-Line Processes”, 2007, SPIE Proceeding Series, vol. 6520; 65200K.
Capetti, et al., “Sub k1=0.25 Lithography with Double Patterning Technique 45nm Technology Node Flash Memory Devices at λ=193nm”, 2007, SPIE Proceeding Series, vol. 6520; 65202K.
Chandra, et al., “An Interconnect Channel Design Methodology for High Performance Integrated Circuits”, 2004, IEEE, Carnegie Mellon University, pp. 1-6.
Cheng, et al., “Feasibility Study of Splitting Pitch Technology on 45nm Contact Paterning with 0.93 NA”, 2007, SPIE Proceeding Series, vol. 6520; 65202N.
Chow, et al., “The Design of a SRAM-Based Field-Programmable Gate Array—Part II: Circuit Design and Layout”, 1999, IEEE, vol. 7 # 3 pp. 321-330.
DeVor, et al., “Statistical Quality Design and Control”, 1992, Macmillan Publishing Company, pp. 264-267.
Dusa, et al. “Pitch Doubling Through Dual Patterning Lithography Challenges in Integration and Litho Budgets”, 2007, SPIE Proceedings Series, vol. 6520; 65200G.
El-Gamal, “Fast, Cheap and Under Control: The Next Implementation Fabric”, Jun. 2-6, 2003, ACM Press, pp. 354-355.
Frankel, “Quantum State Control Interference Lithography and Trim Double Patterning for 32-16nm Lithography”, 2007, SPIE Proceeding Series, vol. 6520; 65202L.
Hayashida, et al., “Manufactuable Local Interconnect technology Fully Compatible with Titanium Salicide Process”, Jun. 11-12, 1991, VMIC Conference.
Heng, et al., “A VLSI Artwork Legalization Technique Base on a New Criterion of Minimum Layout Perturbation”, 1997, ACM Press, pp. 116-121.
Hu, et al., “Synthesis and Placement Flow for Gain-Based Programmable Regular Fabrics”, Apr. 6-9, 2003, ACM Press, pp. 197-203.
Hutton, et al., “A Methodology for FPGA to Structured-ASIC Synthesis and Verification”, 2006, EDAA, pp. 64-69.
Jayakumar, et al., “A Metal and VIA Maskset Programmable VLSI Deisgn Methodology using PLAs”, 2004, IEEE, pp. 590-594.
Kheterpal, et al., “Routing Architecture Exploration for Regular Fabrics”, DAC, Jun. 7-11, 2004, ACM Press, pp. 204-207.
Kheterpal, et al., “Design Methodolgy for IC Manufactrability Based on Regular Logic-Bricks”, DAC, Jun. 13-17, 2005, IEEE/AMC, vol. 6520.
Kim, et al., “Issues and Challenges of Double Patterning Lithography in DRAM”, 2007, SPIE Proceeding Series, vol. 6520; 65200H.
Kim, et al., “Double Exposure Using 193nm Negative Tone Photoresist”, 2007, SPIE Proceeding Series, vol. 6520; 65202M.
Koorapaty, et al., “Heterogeneous Logic Block Architectures for Via-Patterned Programmable Fabric&

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