Spectrographic metrology of patterned wafers

Optics: measuring and testing – By dispersed light spectroscopy

Reexamination Certificate

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C382S145000

Reexamination Certificate

active

07969568

ABSTRACT:
Light reflected from respective image elements of a workpiece is channeled through respective light channeling elements to respective locations of a spectrographic light disperser. Spectral distributions of the respective image elements produced by the spectrographic light disperser are recorded. A processor groups similar spectral distributions into respective groups of mutually similar distributions, and classifies the groups by the number of distributions contained in each group.

REFERENCES:
patent: 5834203 (1998-11-01), Katzir et al.
patent: 6640014 (2003-10-01), Price et al.
patent: 6974963 (2005-12-01), Tanaka et al.
patent: 7245412 (2007-07-01), Bruland et al.
patent: 2002/0054704 (2002-05-01), Smilansky et al.
patent: 2002/0108892 (2002-08-01), Goetz et al.
patent: 2004/0246493 (2004-12-01), Kim et al.
patent: 2005/0046850 (2005-03-01), Chow
patent: 2007/0229852 (2007-10-01), Wack et al.

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